A process for washing a substrate. The process involves providing a detergent composition that includes a surfactant and an antifoam. The antifoam comprises a hydrophobic fluid having a surface tension of at least 27 mN/m and less than 40 mN/m and a finely divided solid hydrophobic filler dispersed in the hydrophobic fluid. The process further involves washing the substrate in an aqueous medium with the detergent composition. The antifoam does not affect foaming during the washing step. During the washing step, the detergent composition is applied to the substrate. The process further involves rinsing the substrate with the applied detergent composition with water, whereby foaming during the rinsing step is inhibited.基材を洗浄する方法。前記方法は、界面活性剤及び消泡剤を含む洗剤組成物を供給する工程を含む。前記消泡剤は、少なくとも２７ｍＮ／ｍ、かつ４０ｍＮ／ｍ未満の表面張力を有する疎水性流体と、前記疎水性流体中に分散している超微粒子状固体疎水性充填剤とを含む。前記方法は、水性媒体中の基材を洗剤組成物で洗浄する工程を更に含む。消泡剤は、洗浄工程中の発泡に影響を与えない。洗浄工程中、洗剤組成物が基材に適用される。前記方法は、洗剤組成物が適用されている基材を水ですすいで、すすぎ工程中の発泡を阻害する工程を更に含む。
