A chamber (200; 300; 400; 500; 600; 700; 900; 1000) for physical vapor deposition is provided. The chamber includes a housing (210; 310; 410; 510; 610; 710; 910; 1010), a door (220; 320; 420; 520; 620; 720; 920 1100; 1220) for opening and closing the housing; and a bearing (240; 340; 440; 540; 640; 740; 940; 1140; 1240) for receiving a target (230), wherein the bearing is oriented in a first direction (260). Further, the chamber is adapted so that the target is at least partially removable from the chamber in the first direction. According to an embodiment, a chamber (200; 300; 400; 500; 600; 700; 900; 1000,) for physical vapor deposition is provided. The chamber is adapted for receiving at least one target (230) and a substrate. The chamber includes a housing; a door; and at least one bearing for mounting the target, wherein the bearing is attached to the door.
