気体媒体の処理のための装置および方法、ならびに、気体媒体、液体、固体、表面またはそれらの任意の組合せの処理のための装置の使用

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专利权人:

ボードウィン，ジャン−ミシェルＢＥＡＵＤＯＵＩＮ， ＪＥＡＮ−ＭＩＣＨＥＬ

发明人:

ボードウィン，ジャン−ミシェル

申请号：

JP20130526474

公开号：

JP6122383(B2)

申请日:

2011.09.01

申请国别(地区):

日本

年份:

2017

代理人:

摘要：

The device for the treatment of a gaseous medium according to the invention comprises in flow direction of the gaseous medium a plasma-generating device for the generation of a plasma in the gaseous medium. The plasma comprises in particular excited molecules, radicals, ions, free electrons, photons and any combination thereof. Furthermore, the device according to the invention comprises at least one dielectric structure, in particular at least one fused silica tube. The plasma is conveyable into the at least one dielectric structure, in particular after generation in the plasma-generating device.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/