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金属酸化物膜の製造方法及び薄膜トランジスタの製造方法
专利权人:
富士フイルム株式会社
发明人:
高田 真宏,田中 淳,鈴木 真之
申请号:
JP20130205315
公开号:
JP6061831(B2)
申请日:
2013.09.30
申请国别(地区):
日本
年份:
2017
代理人:
摘要:
The present invention provides a method for producing a metal oxide film which includes: a step for coating a substrate with a solution containing a metal nitrate, and forming a metal oxide precursor film by drying the film coat; and a step for changing the metal oxide precursor film into a metal oxide film by irradiating the metal oxide precursor film with ultraviolet light containing two or more peak components for which the intensity of illumination is 10mW/cm2 or higher in a wavelength band at or below 300nm. The present invention further provides a metal oxide film produced by this method, and a device provided with the same.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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