Rohm and Haas Electronic Materials LLC;Dow Global Technologies LLC
发明人:
DUAN, Lingli,CHEN, Chen,FENG, Shaoguang,NIAZIMBETOVA, Zuhra I.,RZEZNIK, Maria Anna
申请号：
EP20150890233
公开号：
EP3288991(A4)
申请日:
2015.04.28
申请国别(地区):
欧洲专利局
年份:
2018
代理人:
摘要：
Reaction products of diamines with the reaction products of monoamines and bisanhydrides are included as additives in metal electroplating baths. The metal electroplating baths have good throwing power and deposit metal layers having substantially planar surfaces. The metal plating baths may be used to deposit metal on substrates with surface features such as through-holes and vias.
