Wang Deyan,Trefonas, III Peter,Gallagher Michael K.
申请号：
US201012858213
公开号：
US9958780(B2)
申请日:
2010.08.17
申请国别(地区):
美国
年份:
2018
代理人:
Mintz Levin Cohn Ferris Glovsky and Popeo, P.C. `Corless Peter F.
摘要：
In one aspect, the present invention relates to coating compositions that comprise a resin component, wherein the predominant portion of the resin component comprising one or more resins that are at least substantially free of fluorine. Coating compositions of the invention are useful as photoresist overcoat layers, including in immersion lithography processing.
