Mintz Levin Cohn Ferris Glovsky and Popeo, P.C. `Corless Peter F.
摘要：
The invention relates to new polymers that comprise units that contain one or more photoacid generator groups and photoresists that contain the polymers. Preferred polymers of the invention are suitable for use in photoresists imaged at short wavelengths such as sub-250 nm or sub-200 nm, particularly 248 nm and 193 nm.
