COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST

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专利权人:

Rohm and Haas Electronic Materials Korea Ltd.

发明人:

Ryu Eui-Hyun,Kim Myung-Yeol,Cho EunHye,Lee Jung-June,Sim Jae Hwan

申请号：

US201615283248

公开号：

US2018095367(A1)

申请日:

2016.09.30

申请国别(地区):

美国

年份:

2018

代理人:

摘要：

Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise 1) one or more resins and 2) one or more substituted isocyanurate compounds that are distinct from the 1) one or more resins.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/