Lee Hye-Won,Sim Jae Hwan,Leem Soo Jung,Park Jin Hong,Shin You Rim
申请号：
US201715624701
公开号：
US2018364575(A1)
申请日:
2017.06.15
申请国别(地区):
美国
年份:
2018
代理人:
摘要：
In a preferred aspect, organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise 1) one or more substituted uracil moieties; and 2) one or more reacted dicarboxylic acid groups.
