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Plasma Treatment Device
专利权人:
Erbe Elektromedizin GmbH
发明人:
Matthias Zenker
申请号:
US16703174
公开号:
US20200179030A1
申请日:
2019.12.04
申请国别(地区):
US
年份:
2020
代理人:
摘要:
The plasma sensor monitors parameters characterizing the condition of the plasma during the treatment phase and/or the change thereof in order to recognize a prefiguring or already occurred interruption of the plasma in this manner and to avoid this interruption and, in the ideal case, avoid this by already changing the voltage form previously. The mentioned mechanisms can be used by the control device (22) also during a pulse packet. The length of each pulse packet is adapted at each change of the voltage form according to their characteristics in order to guarantee a constant average power.
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