A plasma treatment device comprises a body portion housing a battery, a gas cylinder, a power supply circuit and a plasma generator comprising a pair of electrodes. The device includes a detachable applicator portion and an elongate duct extending from the generator to convey generated plasma to an outlet of the duct and for directing a plasma plume formed at the outlet onto a treatment area. An annular electrode is disposed at the duct outlet and is connected to the power supply circuit via an elongate electrical conductor. The annular electrode conducts electrons in the plasma away from the plasma plume to avoid sensation caused by resultant current flow. A circuit may be provided to measure the current flow from the annular electrode, the circuit allowing adjustment of the power supplied to the pair of electrodes based on the measured current.
