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PLASMA TREATMENT SYSTEM
专利权人:
Olympus Corporation
发明人:
ISHIKAWA, Manabu,KIMURA, Shuichi,WATANABE, Koichiro
申请号:
EP15776233
公开号:
EP3130303A4
申请日:
2015.03.27
申请国别(地区):
EP
年份:
2017
代理人:
摘要:
In a plasma treatment system, a coefficient K which is a ratio of a supply amount and a suction amount of saline and also a minimal water amount required for generation of plasma is provided, and the required supply amount and suction amount of the saline are set from the coefficient K acquired on the basis of an output level of high-frequency energy, thereby performing a plasma treatment.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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