PLASMA TREATMENT SYSTEM

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专利权人:

Olympus Corporation

发明人:

ISHIKAWA, Manabu,KIMURA, Shuichi,WATANABE, Koichiro

申请号：

EP15776233

公开号：

EP3130303A4

申请日:

2015.03.27

申请国别(地区):

EP

年份:

2017

代理人:

摘要：

In a plasma treatment system, a coefficient K which is a ratio of a supply amount and a suction amount of saline and also a minimal water amount required for generation of plasma is provided, and the required supply amount and suction amount of the saline are set from the coefficient K acquired on the basis of an output level of high-frequency energy, thereby performing a plasma treatment.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/