Mark Anthony Fernance Kendall;Derek William Kenneth Jenkins
发明人:
Mark Anthony Fernance Kendall,Derek William Kenneth Jenkins
申请号：
US12866717
公开号：
US08883015B2
申请日:
2009.02.05
申请国别(地区):
US
年份:
2014
代理人:
摘要：
A method of producing projections on a patch including providing a mask on a substrate and etching the substrate using an etchant and a passivant to thereby control the etching process and form the projections, wherein the passivant does not include oxygen.
