Mark Anthony Fernance KENDALL,Derek William Kenneth JENKINS
申请号：
US15010734
公开号：
US20160220803A1
申请日:
2016.01.29
申请国别(地区):
US
年份:
2016
代理人:
摘要：
A method of producing projections on a patch including providing a mask on a substrate and etching the substrate using an etchant and a passivant to thereby control the etching process and form the projections, wherein the passivant does not include oxygen.
