用於遏制光暴露導致的異常皮膚細胞的形成的試劑

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专利权人:

OTSUKA PHARMACEUTICAL CO. LTD.;KANDA-TSUKASAMACHI 2-CHOME

发明人:

MITSUAKI KAWAMURA,SHIGEO SHINOHARA,FUMIKI HARANO,AKIHIRO AOKI,ERI UENO

申请号：

HK13108231.7

公开号：

HK1180951B

申请日:

2013.07.12

申请国别(地区):

HK

年份:

2015

代理人:

摘要：

An object of the present invention is to provide an agent for suppressing the formation of skin cells induced by exposure to light such as ultraviolet light. The object is achieved by using a purine nucleic acid for suppressing the formation of abnormal skin cells caused by exposure to light.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/