高分子化合物の重合方法、レジスト組成物、レジストパターン形成方法

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专利权人:

東京応化工業株式会社

发明人:

太宰 尚宏,新井 雅俊,内海 義之

申请号：

JP20130041067

公开号：

JP6122663(B2)

申请日:

2013.03.01

申请国别(地区):

日本

年份:

2017

代理人:

摘要：

A polymerization method of a high-molecular weight compound (A1) having a constituent unit (a0) derived from a compound represented by the following general formula (a0-1), which has excellent lithography properties, and is useful as a resist composition, the method including conducting polymerization using a mixed solvent containing 10 mass % or more of one or more of a cyclic ketone-based solvent, an ester-based solvent, and a lactone-based solvent. A resist composition containing the high-molecular weight compound (A1) and a method for forming a resist pattern using the same.

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