Francois-Didier Boyer,Catherine Rameau,Jean-Paul Pillot,Vincent Servajean,Alexandre De Saint Germain,Jean-Marie Beau,Jean-Bernard Pouvreau,Guillaume Clave
申请号：
US14403132
公开号：
US20150141255A1
申请日:
2013.05.23
申请国别(地区):
US
年份:
2015
代理人:
摘要：
A compound of general formula (I):in which X represents O, S, NH or an N-alkyl radical, R1 and R2, identical or different, each represent H or a C1-C10 hydrocarbon radical, R1 and R2 not both representing H, R3 represents a C1-C10 hydrocarbon radical, and R represents a phenyl radical monosubstituted or disubstituted by a substituent Y and, if applicable, a substituent Z, chosen from Cl, Br, I and CF3, or R represents a C═R4(R5) radical in which R4 represents an hydrocarbon radical and R5 represents a linear or branched, saturated or unsaturated, hydrocarbon radical, optionally substituted, a COR6 group or a CO2R6 group, where R6 represents a hydrogen atom or a linear or branched, saturated or unsaturated, hydrocarbon radical. This compound can be used for the treatment of higher plants for controlling their growth and architecture.
