SYSTEM FOR GENERATION OF CHEMICALLY ACTIVE GAS AND METHOD OF TREATING PRODUCT USING CHEMICALLY ACTIVE GAS

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专利权人:

发明人:

申请号：

RU2018118775

公开号：

RU2018118775A3

申请日:

申请国别(地区):

RU

年份:

2019

代理人:

摘要：

A method of treating a product or surface with a reactive gas, comprises producing the reactive gas by forming a high-voltage cold plasma (HVCP) from a working gas； transporting the reactive gas at least 5 cm away from the HVCP； followed by contacting the product or surface with the reactive gas. The HVCP does not contact the product or surface.

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中国工程科技知识中心

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http://www.ckcest.cn/home/