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DISPOSITIF À SOURCE D'IONS, GÉNÉRATION DE FAISCEAU À PARTICULES ET PROCÉDÉ DE GÉNÉRATION DE FAISCEAU IONIQUE
专利权人:
National Institutes for Quantum and Radiological Science and Technology
发明人:
申请号:
EP19154594.6
公开号:
EP3524320A1
申请日:
2019.01.30
申请国别(地区):
EP
年份:
2019
代理人:
摘要:
There are provided a small-sized ion source device, a particle beam generation device, and an ion beam generation method which generate a plurality of ion species while switching the ions species in a short time. An ion source device 1 which generates an ion beam from gas introduced into a vacuum, the ion source device including: a chamber 12 whose inside is a vacuum; a gas supply unit 26 which supplies gas to the inside of the chamber; and an ionization energy supply unit which supplies ionization energy for ionizing atoms of the gas to the inside of the chamber, wherein the gas supply unit 26 includes: a plurality of gas cylinders (17A, 17B, and 17C) each of which is filled with each of a plurality types of gases; pipes (24A, 24B, 24C, and 25) connected to the gas cylinders to feed the gases to the chamber; and pulse-control gas valves (21A, 21B, and 21C) which are attached to the pipes and are settable to an open state in a pulsed manner for a short period of time.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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