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基板上に均一な金属膜を形成するための方法及び装置
专利权人:
エーシーエム リサーチ (シャンハイ) インコーポレーテッド
发明人:
ワン ホイ,マー ユエ,ホー チュアン,ワン シ
申请号:
JP20140516156
公开号:
JP6113154(B2)
申请日:
2011.06.24
申请国别(地区):
日本
年份:
2017
代理人:
摘要:
An apparatus for substrate metallization from electrolyte is provided. The apparatus comprises: an immersion cell containing metal salt electrolyte; at least one electrode connecting to at least one power supply; an electrically conductive substrate holder holding at least one substrate to expose a conductive side of the substrate to face the at least one electrode; an oscillating actuator for oscillating the substrate holder with an amplitude and a frequency; at least one ultrasonic device with an operating frequency and an intensity, disposed in the metallization apparatus; at least one ultrasonic power generator connecting to the ultrasonic device; at least one inlet for metal slat electrolyte feeding; and at least one outlet for metal salt electrolyte draining.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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