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BARREL PLATING OR HIGH-SPEED ROTARY PLATING USING A NEUTRAL TIN PLATING SOLUTION
专利权人:
Rohm and Haas Electronic Materials LLC
发明人:
Kondo Makoto,Mizuno Yoko
申请号:
US201715730244
公开号:
US2018135195(A1)
申请日:
2017.10.11
申请国别(地区):
美国
年份:
2018
代理人:
摘要:
A barrel plating or high-speed rotary plating method for electronic components, and a neutral tin plating solution used therein. A plating solution that includes (A) stannous ions, (B) an acid or a salt, (C) a complexing agent, and (D) a diamine that has a polyoxyalkylene chain, and that has a pH in a range between 4 and 8 is used. The use of this neutral tin plating solution prevents the electronic components from coupling together during the barrel plating, enabling an improvement in manufacturability in barrel plating.
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中国工程科技知识中心
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http://www.ckcest.cn/home/

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