The surface it processes with simple process, the finishing particulate which precision of the finishing well is controlled, it offers the finishing device and the finishing method of the particulate. The finishing device which relates to this invention possesses, the container the heating mechanism the gas introduction mechanism which introduces the gas into 4 which heats the particulate 1 which is mounted in the chamber 3 which accommodates 2 which mounts particulate 1 and the aforementioned container 2 and the aforementioned container 2 and the aforementioned chamber 3 and, features that the surface it processes the aforementioned particulate 1.簡易な工程で表面処理し、その表面処理の程度を精度良く制御した表面処理微粒子、表面処理装置及び微粒子の表面処理方法を提供する。本発明に係る表面処理装置は、微粒子1を載置する容器2と、前記容器2を収容するチャンバー3と、前記容器2に載置された微粒子1を加熱する加熱機構4と、前記チャンバー3内にガスを導入するガス導入機構と、を具備し、前記微粒子1を表面処理することを特徴とする。
