PROBLEM TO BE SOLVED: To provide a polishing residue scattering prevention composition for nails or skin that exhibits good polishing residue subsumption, with which good polishing workability can be obtained even when treatment time is prolonged, and for which washability of a polishing machine after use thereof is excellent.SOLUTION: The polishing residue scattering prevention composition for nails or skin has a ratio of water with respect to all the solvent components contained in the polishing residue scattering prevention composition of 30 to 70 mass%, and has a ratio occupied by a polymeric compound having solubility in alcohol and water with respect to the total mass of polymeric compounds of 85 mass% or more.SELECTED DRAWING: NoneCOPYRIGHT: (C)2018,JPO&INPIT【課題】良好な研磨カス包摂性、および施術時間が長引いた場合であっても良好な研磨作業性が得られ、かつ使用後の研磨器具の洗浄性に優れた、爪または皮膚の研磨カス飛散防止組成物を提供する。【解決手段】研磨カス飛散防止組成物が含有する全溶媒成分量に対する水の割合が30~70質量%であり、高分子化合物の全質量に対する、アルコールおよび水に対して溶解性を有する高分子化合物の占める割合が85質量%以上である、爪または皮膚の研磨カス飛散防止組成物。【選択図】なし
