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DISPOSITIF D'IRRADIATION PAR FAISCEAU D'ÉLECTRONS ET SON PROCÉDÉ DE FABRICATION
专利权人:
Hitachi Zosen Corporation
发明人:
申请号:
EP18856749.9
公开号:
EP3683803A1
申请日:
2018.09.05
申请国别(地区):
EP
年份:
2020
代理人:
摘要:
An electron beam irradiation device (1) includes a vacuum chamber (2) having an electron beam generator (21) inside, a vacuum nozzle (3), and a window foil (4) on a tip of the vacuum nozzle (3). The electron beam irradiation device (1) further includes an outer pipe (7) surrounding the vacuum nozzle (3), a cooling-gas supply unit (9) that supplies cooling gas (C) into a coolant passage (8) formed between the vacuum nozzle (3) and the outer pipe (7), and a heat-conducting transmission foil (6) fitted to the window foil (4) and contacting the tip of the vacuum nozzle (3). The heat-conducting transmission foil (6) has a value of at least 63 × 10-3, which is determined by dividing a thermal conductivity [W/(m·K)] by a density [kg/m3], and a tip part of the vacuum nozzle (3) is made of a material having at least a thermal conductivity of copper.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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