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Pecvd coating using an organosilicon precursor
专利权人:
SIO2 MEDICAL PRODUCTS INC.
发明人:
FELTS JOHN T,FISK THOMAS E,ABRAMS ROBERT S,PANGBORN ROBERT J,SAGONA PETER J
申请号:
NZ59623910
公开号:
NZ596239A
申请日:
2010.05.12
申请国别(地区):
NZ
年份:
2014
代理人:
摘要:
A method for coating a substrate surface by PECVD is provided, the method comprising generating a plasma from a gaseous reactant comprising an organosilicon precursor and optionally O2. The lubricity, hydrophobicity and/or barrier properties of the coating are set by setting the ratio of the O2 to the organosilicon precursor in the gaseous reactant, and/or by setting the electric power used for generating the plasma. In particular, a lubricity coating made by said method is provided. Vessels coated by said method and the use of such vessels protecting a compound or composition contained or received in said coated vessel against mechanical and/or chemical effects of the surface of the uncoated vessel material are also provided. Wherein the coating having the following atomic ratios, measured by X-ray photoelectron spectroscopy (XPS), SiwOxCy where w is 1, x in this formula is from about 0.5 to 2.4, and y is from about 0.6 to about 3,
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