Joseph A. Jones,John T. Felts,James Troy Gresham,Brian Russell Lilly,Thomas E. Fisk
申请号：
US14214030
公开号：
US20140274825A1
申请日:
2014.03.14
申请国别(地区):
US
年份:
2014
代理人:
摘要：
A method for coating a substrate surface such as a syringe part by PECVD is provided, the method comprising generating a plasma from a gaseous reactant comprising an organosilicon precursor and optionally an oxidizing gas by providing plasma-forming energy adjacent to the substrate, thus forming a coating on the substrate surface by plasma enhanced chemical vapor deposition (PECVD). The plasma-forming energy is applied in a first phase as a first pulse at a first energy level followed by further treatment in a second phase at a second energy level lower than the first energy level. The lubricity, hydrophobicity and/or barrier properties of the coating are set by setting the ratio of the O2 to the organosilicon precursor in the gaseous reactant, and/or by setting the electric power used for generating the plasma.
