Provided are a photocatalyst transfer film which enables transfer processing of a photocatalyst layer, said photocatalyst layer being uniform and highly transparent and exhibiting antibacterial properties in the dark, onto the surface of various transfer substrates, and a method for manufacturing the photocatalyst transfer film. The photocatalyst transfer film comprises a base film and a photocatalyst layer disposed thereon, said photocatalyst layer comprising a photocatalyst containing titanium oxide particles, antibacterial metal-containing alloy particles, a silicon compound and a surfactant. The method for manufacturing a photocatalyst transfer film is characterized by comprising applying a photocatalyst coating solution, which comprises a photocatalyst containing titanium oxide particles, antibacterial metal-containing alloy particles, a silicon compound, a surfactant and an aqueous dispersion medium, to a base film and drying.本發明提供光觸媒轉印薄膜及其製造方法，該光觸媒轉印薄膜可於各種轉印基材表面，轉印加工均一且透明性高，且於暗處顯示抗菌性之光觸媒層。該光觸媒轉印薄膜係於基底薄膜上，具有含有含氧化鈦粒子之光觸媒、含有抗菌性金屬之合金粒子、矽化合物及界面活性劑之光觸媒層。該光觸媒轉印薄膜之製造方法之特徵係將含有含氧化鈦粒子之光觸媒、含有抗菌性金屬之合金粒子、矽化合物、界面活性劑及水性分散介質之光觸媒塗佈液塗佈於基底薄膜上並乾燥。
