Jae-Chul Choi,IL-Han Lee,Heejin Cho,Seung Hoon Kim
申请号:
US16470890
公开号:
US20200085857A1
申请日:
2017.12.15
申请国别(地区):
US
年份:
2020
代理人:
摘要:
Disclosed is a composition for alleviating symptoms of atopic dermatitis that contains a high molecular weight poly-gamma-glutamic acid and a low molecular weight poly-gamma-glutamic acid as active components. The composition for improving symptoms of atopic dermatitis inhibits epidermal and transepidermal water loss, improves desquamation (scaling skin), provides an excellent skin soothing effect, and relieves pruritus (itch) caused by dryness, thereby making remarkable improvement of general symptoms of atopic dermatitis.