PROBLEM TO BE SOLVED: To provide a projection exposure whose constitution can be made simple.SOLUTION: Disclosed is a projection exposure in which a pattern formed on a reflection type mask M is projection-exposed onto a sensitive substrate P. The projection exposure comprises: a projection optical system PL having a first image forming optical system PF1 of forming an intermediate image of the pattern of a reflection type mask between the reflection type mask and the sensitive substrate and a second image forming optical system PF2 of again image forming the intermediate image onto the sensitive substrate; an illumination system IL of producing illumination light for illuminating the pattern of the reflection type mask; and a light divider DL arranged at a space in which the intermediate image is formed between the first image forming optical system and the second image forming optical system, introducing the illumination light from the illumination system toward the pattern of the reflection type mask via t
