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荷電粒子ビーム描画装置及び荷電粒子ビームの照射量変調係数の取得方法
专利权人:
株式会社ニューフレアテクノロジー
发明人:
中山田 憲昭,加藤 靖雄,菅沼 瑞奈
申请号:
JP20140059155
公开号:
JP6259694(B2)
申请日:
2014.03.20
申请国别(地区):
日本
年份:
2018
代理人:
摘要:
A apparatus includes a unit to operate a first dose of a beam corrected for a proximity effect for each of second mesh regions of a second mesh size obtained by dividing the first mesh size by a product of a natural number and a number of passes, by using a dose model using a dose threshold; a unit to operate a representative temperature rising due to heat transfer originating from irradiation of the beam by using a dose for an applicable pass of the first dose and a unit to operate a polynomial having a term obtained by multiplying a dose modulation coefficient based on the representative temperature by a pattern area density as an element, and a dose that makes a difference between a value obtained by operating the polynomial and the dose threshold within a tolerance is used.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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