荷電粒子ビーム描画装置及び荷電粒子ビームの照射量チェック方法

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专利权人:

株式会社ニューフレアテクノロジー

发明人:

加藤 靖雄,菅沼 瑞奈

申请号：

JP20120255312

公开号：

JP6076708(B2)

申请日:

2012.11.21

申请国别(地区):

日本

年份:

2017

代理人:

摘要：

A charged particle beam writing apparatus according to one aspect of the present invention includes a calculation unit to calculate a dose density that corrects a dimensional variation caused by at least one of a proximity effect, a fogging effect, and a loading effect, and indicates a dose per unit area of a charged particle beam, where the dose density has been modulated based on a dose modulation amount input from outside, a determination unit to determine whether the dose density exceeds an acceptable value, and a writing unit to write a pattern on a target object with the charged particle beam.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/