To provide a plant cultivation device that can suppress rise in temperature of liquid fertilizer and lack of oxygen on a root surface.SOLUTION: A plant cultivation device comprises: a plant holding part 5 which holds a plant 6 and is capable of leading roots extending from the plant 6 to outside； a cultivation tank 2 on which the plant holding part 5 is mounted, which is capable of storing liquid fertilizer, and has a bottom surface 2a receiving roots extending from the plant 6 and has a sidewall 2b surrounding the plant holding part 5； a plurality of drain holes 13 which are formed in the cultivation tank 2 and adjust a water level of liquid fertilizer by draining at least a part of the liquid fertilizer； a reservoir tank 7 which is capable of storing at least a part of liquid fertilizer drained from the plurality of the drain holes 13； a pump 17 which circulates liquid fertilizer by supplying at least a part thereof stored in the reservoir tank 7 to the cultivation tank 2； and a pump control part 19 which performs control of intermittent operation of the pump 17, in which the pump control part 17 adjusts ratio of down time with respect to circulation time of the pump 17 corresponding to the growth of the plant 6.SELECTED DRAWING: Figure 2【課題】液肥の温度上昇および根表面での酸素不足を抑制することができる植物栽培装置を提供する。【解決手段】植物６を保持し、かつ、植物６から伸びた根を外部に通すことが可能な植物保持部５と、植物保持部５が載置され、液肥を溜めることが可能な栽培槽２であって植物６から伸びた根を受ける底面２ａ及び植物保持部５を包囲する側壁２ｂとを有する栽培槽２と、栽培槽２に形成され、液肥の少なくとも一部を排水することで液肥の水位を調整する複数の排水穴１３と、複数の排水穴１３から排水された少なくとも一部を溜めることが可能な貯槽タンク７と、貯槽タンク７に溜められた少なくとも一部を栽培槽２に供給することで液肥を循環させるポンプ１７と、ポンプ１７を間欠動作させる制御を行うポンプ制御部１９と、を備え、ポンプ制御部１７は、植物６の生長に応じて、ポンプ１７の循環時間に対する中断時間の比率を調整する。【選択図】図２
