THIN-FILM MASK, FITTING AIDS, FITTING AND EXPOSURE DEVICE AND FITTING METHOD FOR THE THIN-FILM MASK PASTED ON A CURVED SUBSTRATE

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专利权人:

HSU Ming-An;LIN Wen-Fu

发明人:

HSU Ming-An,LIN Wen-Fu

申请号：

US201615293619

公开号：

US2017108770(A1)

申请日:

2016.10.14

申请国别(地区):

美国

年份:

2017

代理人:

摘要：

A thin-film mask, fitting aids, fitting and exposure assistant device and fitting method for the thin-film mask paste on a curved substrate is disclosed. The disclosure uses the fitting aids to apply pressure on the thin-film mask to paste on the curved substrate. After the template device had formed, send the template device to the exposure machine, and the high resolution color photoresist pattern is made on the curved substrate.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/