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UV-Halbleiterlichtquellen-Bestrahlungseinrichtung und deren Verwendung
专利权人:
SCHOTT AG
发明人:
SKLAREK, WERNER, DR.,Werner, Dr. Sklarek,WOELFING, BERND, DR.,Bernd, Dr. Wölfing
申请号:
DE102010047318
公开号:
DE102010047318A1
申请日:
2010.10.01
申请国别(地区):
DE
年份:
2012
代理人:
摘要:
Kompakte UV-Halbleiterlichtquellen-Bestrahlungseinrichtung, in der ein durch eine Bestrahlungskammer (2) geleitetes Medium von einer UV-Halbleiterlichtquelle in einem gemittelten Winkel α von größer als 60° zur Hauptflussrichtung R durch das zu bestrahlende Medium hindurchtritt und die von der UV-Halbleiterlichtquelle (1) emittierte Strahlung mehrfach innerhalb der Bestrahlungskammer (2) reflektiert werden kann.Ultraviolet semiconductor light source-irradiation device comprises at least one ultraviolet semiconductor light source (1), and an irradiation chamber (2), by which a medium to be irradiated is conducted along a main flow direction. The primary radiation emitted by the ultraviolet semiconductor light source in the operating state passes at an angle of greater than 60[deg] to the main flow direction through the medium to be irradiated. The inner wall (3) of the irradiation chamber for the emitted radiation of the ultraviolet semiconductor light source exhibits a reflection degree of at least 95%. Ultraviolet semiconductor light source irradiation device comprises at least one ultraviolet semiconductor light source (1) and an irradiation chamber (2), by which a medium to be irradiated is conducted along a main flow direction. The primary radiation emitted by the ultraviolet semiconductor light source in the operating state passes in an average angle (alpha ) of greater than 60[deg] to the main flow direction through the medium to be irradiated. The inner wall (3) of the irradiation chamber for the emitted radiation of the ultraviolet semiconductor light source exhibits a reflection degree of at least 95%, so that the radiation emitted by the ultraviolet semiconductor light source is reflected several times within the irradiation chamber. An independent claim is also included for irradiating the medium conducted along the main flow direction with ultraviolet radiation through the irradiation chamber.
来源网站:
中国工程科技知识中心
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http://www.ckcest.cn/home/

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