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ハロゲン含有プラズマに露出された表面の浸食速度を減じる装置及び方法
专利权人:
アプライド マテリアルズ インコーポレイテッドAPPLIED MATERIALS,INCORPORATED
发明人:
ジェニファー ワイ サン,レングアン デュアン,ジエ ユアン,リー スー,ケネス エス コリンズ
申请号:
JP20160006345
公开号:
JP6259844(B2)
申请日:
2016.01.15
申请国别(地区):
日本
年份:
2018
代理人:
摘要:
A ceramic article which is resistant to erosion by halogen-containing plasmas used in semiconductor processing. The ceramic article includes ceramic which is multi-phased, typically including two phases to three phases. In a first embodiment, the ceramic is formed from yttrium oxide at a molar concentration ranging from about 50 mole % to about 75 mole %; zirconium oxide at a molar concentration ranging from about 10 mole % to about 30 mole %; and at least one other component, selected from the group consisting of aluminum oxide, hafnium oxide, scandium oxide, neodymium oxide, niobium oxide, samarium oxide, ytterbium oxide, erbium oxide, cerium oxide, and combinations thereof, at a molar concentration ranging from about 10 mole % to about 30 mole %. In a second embodiment, the ceramic article includes ceramic which is formed from yttrium oxide at a molar concentration ranging from about 90 mole % to about 70 mole % and zirconium oxide at a molar concentration ranging from about 10 mole % to about 30 mole %, ,
来源网站:
中国工程科技知识中心
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http://www.ckcest.cn/home/

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