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Mold for thermal nanoimprint lithography, process for fabricating the same, and nanoimprint process using the same
专利权人:
Commissariat a l'Energie Atomique et aux Energies Alternatives
发明人:
Landis Stefan,Nicoletti Sergio
申请号:
US201113227388
公开号:
US8974215(B2)
申请日:
2011.09.07
申请国别(地区):
美国
年份:
2015
代理人:
Knobbe Martens Olson &` Bear LLP
摘要:
A heating mold for thermal nanoimprint lithography is disclosed. According to one aspect, the mold includes a resistive heating element and collecting element for collecting the electromagnetic energy of a variable electromagnetic field emitted by a source located outside the mold. The collecting element being connected to the resistive heating element in which the electromagnetic energy is dissipated. A method for manufacturing the mold, a thermal nanoimprint lithography device including the mold, and a a method for preparing a substrate including a surface nanostructured by a thermal nanoimprint lithography technique using the mold is applied are also disclosed.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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