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ELECTRON MICROSCOPE EQUIPPED WITH ELECTRON BEAM BIPRISM DEVICE
专利权人:
JEOL LTD
发明人:
TOMITA TAKESHI
申请号:
JP20000305796
公开号:
JP2002117800(A)
申请日:
2000.10.05
申请国别(地区):
日本
年份:
2002
代理人:
摘要:
PROBLEM TO BE SOLVED: To provide an electron microscope equipped with an electron beam biprism device capable of effectively taking out information about the phase change of an electron beam, and further enhancing the spacial resolution of phase information. SOLUTION: Two of a first objective 7a and a second objective 7b are disposed between a specimen 6 and an electron beam biprism device 8 so as not to give the influence of their magnetic fields to the specimen 6. Energization of the first objective 7a and the second objective 7b is properly controlled in order to variably control the image magnification of the specimen, and a voltage applied to the beam electrode 8a of the beam biprism device 8 is variably controlled in order to adjust a space between interference fringes. Thereby, the image magnification of the specimen image and the space between the interference fringes corresponding to the purpose can be obtained.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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