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被覆膜とその製造方法およびPVD装置
专利权人:
日本アイ・ティ・エフ株式会社;日本ピストンリング株式会社
发明人:
森口 秀樹,柴田 明宣,大城 竹彦,伊東 義洋,岡▲崎▼ 孝弘,杉浦 宏幸
申请号:
JP20170519015
公开号:
JP6273563(B2)
申请日:
2016.12.16
申请国别(地区):
日本
年份:
2018
代理人:
摘要:
The purpose of the invention is to provide technology, which, in addition to being capable of forming thick hard carbon films of excellent durability even using PVD, is able to establish both chipping resistance and abrasion resistance in the formed hard carbon film and able to improve low friction properties and peeling resistance. Provided is a coating film to be coated on the surface of a substrate, the coating film having a total film thickness of greater than 1 µm to 50 µm wherein: when a cut surface is observed using bright field TEM images, white hard carbon layers that are shown as relatively white and black hard carbon layers that are shown as black are alternately laminated in the thickness direction; and the white hard carbon layers have regions that have grown in a fan-shape in the thickness direction. Provided is a coating film manufacturing method for forming the coating film on the surface of a substrate using PVD, wherein conditions for film formation on the substrate are controlled so that
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