Kevin M. Daniels;Russell L. Low;Benjamin B. Riordon
发明人:
Kevin M. Daniels,Russell L. Low,Benjamin B. Riordon
申请号：
US12756026
公开号：
US09076914B2
申请日:
2010.04.07
申请国别(地区):
US
年份:
2015
代理人:
摘要：
Herein, an improved technique for processing a substrate is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for processing a substrate. The method may comprise directing an ion beam comprising a plurality of ions along an ion beam path, from an ion source to the substrate； disposing at least a portion of a mask in the ion beam path, between the ion source and the substrate； and translating one of the substrate and the mask relative to other one of the substrate and the mask.
