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PHOTOCURABLE COMPOSITION, DENTURE BASE, AND PLATE DENTURE
专利权人:
MITSUI CHEMICALS; INC.
发明人:
Toshikazu GOMI,Takashi KOURA,Hirohisa SHIODE,Mai KIMURA
申请号:
US15547217
公开号:
US20180014919A1
申请日:
2016.02.01
申请国别(地区):
US
年份:
2018
代理人:
摘要:
The present invention provides a photocurable composition which is used for the production by stereolithography of a dental prosthesis or the like. This photocurable composition contains a (meth)acrylic monomer component and a photopolymerization initiator; and the (meth)acrylic monomer component contains: an acrylic monomer (X) containing, within one molecule, two aromatic rings and two acryloyloxy groups, and having a Mw of from 400 to 580; and at least one of: a (meth)acrylic monomer (A) containing, within one molecule, one or more ether bonds and two (meth)acryloyloxy groups, and having a Mw of from 200 to 400; a (meth)acrylic monomer (B) not containing, within one molecule, a ring structure other than an aromatic ring and one (meth)acryloyloxy group, and having a Mw of from 130 to 240; or a (meth)acrylic monomer (C) containing, within one molecule, a hydrocarbon skeleton and two (meth)acryloyloxy groups, and having a Mw of from 190 to 280.
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