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PHOTOCURABLE COMPOSITION, DENTURE BASE, AND PLATE DENTURE
专利权人:
发明人:
Toshikazu Sakamaki,Takashi Koura,Kouya Kojima,Hirohisa Shiode,Mai Kimura
申请号:
US15765353
公开号:
US20180282455A1
申请日:
2016.10.04
申请国别(地区):
US
年份:
2018
代理人:
摘要:
Provided is a photocurable composition including a monomer component including: a monomer (X) containing, within one molecule, two aromatic rings and two (meth)acryloyloxy groups, and having an Mw of from 400 to 580, and a monomer (H) containing, within one molecule, at least one of a hydroxyl group or a carboxy group, and a (meth)acryloyloxy group, and having an Mw of from 100 to 700 and a photopolymerization initiator. The composition has a functional group value (a) of from 0.5×10−3 to 2.0×10−3 mol/g.Functional group value (a)=(nH/MH)×PH  Formula (a)wherein nH represents the total number of hydroxyl groups and carboxy groups contained in one molecule of the (meth)acrylic monomer (H) MH represents the Mw of the (meth)acrylic monomer (H) and PH represents the mass ratio of the (meth)acrylic monomer (H) with respect to the total amount of the (meth)acrylic monomer component.
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中国工程科技知识中心
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http://www.ckcest.cn/home/

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