KASAHARA KAZUKI,KOSMA VASILIKI,ODENT JEREMY,XU HONG,YU MUFEI,GIANNELIS EMMANUEL P.,OBER CHRISTOPHER K.
申请号：
US201715436009
公开号：
US2017242337(A1)
申请日:
2017.02.17
申请国别(地区):
美国
年份:
2017
代理人:
摘要：
A radiation-sensitive composition includes particles including a metal oxide as a principal component, and an organic solvent. A metal atom constituting the metal oxide includes a first metal atom that is a zinc atom, a boron atom, an aluminum atom, a gallium atom, a thallium atom, a germanium atom, an antimony atom, a bismuth atom, a tellurium atom, or a combination thereof. A percentage content of the first metal atom with respect to total metal atoms in the radiation-sensitive composition is no less than 50 atomic %. A pattern-forming method includes applying the radiation-sensitive composition to form a film on a substrate, exposing the film, and developing the film exposed.
