ポリリジン製剤およびこれを含有する化粧料組成物
- 专利权人:
- JNC株式会社
- 发明人:
- 澤井 俊哉,荒川 健司,畠山 昌和,平木 純
- 申请号：
- JP2008279000
- 公开号：
- JP4947034B2
- 申请日:
- 2008.10.30
- 申请国别(地区):
- JP
- 年份:
- 2012
- 代理人:
- 摘要：
PROBLEM TO BE SOLVED: To provide new antiallergic agents and histamine isolation inhibitors, and a safe cosmetic composition containing at least one of them.
SOLUTION: The antiallergic agents contain &epsi-polylysine. The histamine isolation inhibitors contain &epsi-polylysine. The safe cosmetic composition contains at least one of them. The &epsi-polylysine is allowed to use free &epsi-polylysine an inorganic salt of &epsi-polylysine formed by &epsi-polylysine with such inorganic acids as hydrochloric acid, sulfuric acid and phosphoric acid and an organic salt of &epsi-polylysine formed by &epsi-polylysine with such organic salts as acetic acid, propionic acid, fumaric acid, malic acid, citric acid, maleic acid, adipic acid, gluconic acid and lactic acid. The cosmetic composition improves eczema, pimples and skin roughness gives gloss, firmness and moistness to the skin and is safe for humans and animals.
COPYRIGHT: (C)2009,JPO&INPIT
- 来源网站：
- 中国工程科技知识中心
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