The purpose of the present invention is to provide: a support for forming, by way of a sputtering method or the like, a hydrogen discharge film which is thin, and which does not leak necessary components other than hydrogen gas in an electrochemical element to the exterior; and a laminated hydrogen discharge film which uses said support. This support for forming a hydrogen discharge film is used in order to form a hydrogen discharge film including a metal layer, and is characterized in that: the support is a porous body; the maximum pore size of pores in the porous body which are present in the surface at the side where the hydrogen discharge film is formed is less than 200 nm; and the time taken for 100cc of air to permeate through the porous body in a Gurley test is at least 100 seconds.
