A hollow cathode magnetron sputtering apparatus and Method is provided forproducing thickMolybdenum-100 (Mo-100) coatings on metal substrates. The Mo-100 coatingproduct is particularlyused as the Mo-100 target for irradiation with charged particles beam from amedical cyclotron toproduce technetium and molybdenum radioisotopes. The method includes cathoderingsrearrangement steps and substrates rearrangement steps before and aftersputtering step toimprove the overall material efficiency (OME) of very expensive Mo-100 to 85%.The sputteringprocess also provides the Mo-100 coating a maximum thickness of 300um withdense structure,good adhesion between Mo-100 coating and substrates.
