PROBLEM TO BE SOLVED: To provide a film production method of a metallic thin film capable of obtaining a highly pure metallic thin film without damaging a substrate by fluorine.SOLUTION: A film production method of a metallic thin film to be adopted, which is a method for producing a metallic thin film on the surface of a substrate by a thin film deposition method using a chemical reaction, includes the first step for forming a metal nitride film on the surface of the substrate by supplying raw material gas containing prescribed organic metallic chemical species and nitrogen-containing reaction gas, and the second step for removing nitrogen atoms in the metal nitride film by supplying hydrogen gas onto the surface of the substrate.
