PRODUCTION METHOD OF POLISHING MATERIAL FOR RICE POLISHING, POLISHING MATERIAL FOR RICE POLISHING, AND PRODUCTION METHOD OF WASH-FREE RICE

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专利权人:

ISHIZUKA TAKESHI

发明人:

ISHIZUKA TAKESHI

申请号：

JP20020182824

公开号：

JP2004024973(A)

申请日:

2002.06.24

申请国别(地区):

日本

年份:

2004

代理人:

摘要：

PROBLEM TO BE SOLVED: To provided a polishing material for rice polishing which produces a high quality wash-free rice and is desirable in terms of operation and hygiene. SOLUTION: The method is used for producing the wash-free rice by, adding the polishing material to, and mixing it with material rice, and comprises a process of adjusting the particle size (fine particle screening process) 4 and a process 8 of heat-sterilizing the defatted material (heat sterilization process) are provided. COPYRIGHT: (C)2004,JPO

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