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OFFSET PRINTING PLATE, OFFSET PRINTING APPARATUS, AND OFFSET PRINTING METHOD
专利权人:
THINK LABORATORY CO., LTD.
发明人:
SHIGETA, Tatsuo
申请号:
WO2016JP80209
公开号:
WO2017077825(A1)
申请日:
2016.10.12
申请国别(地区):
世界知识产权组织国际局
年份:
2017
代理人:
摘要:
Provided are an offset printing plate, an offset printing apparatus, and an offset printing method capable of printing a high-definition image with waterless offset printing. The offset printing plate comprises: a cylindrical plate base material; a silicon resin layer formed on the plate base material; and a resist pattern part formed on the silicon resin layer, wherein the silicon resin layer is a non-image part, and the resist pattern part is an image part. The silicon resin layer is preferably formed on the plate base material seamlessly.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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