SUGITA Noriaki,MATSUDA Shuhei,MATSUSHITA Takayuki,TAZURU Mika
申请号：
US201615769934
公开号：
US2018312725(A1)
申请日:
2016.10.21
申请国别(地区):
美国
年份:
2018
代理人:
摘要：
A polishing composition capable of suppressing surface defects and reducing haze is provided. The polishing composition includes: abrasives; at least one water-soluble polymer selected from vinyl alcohol-based resins having a 1,2-diol structural unit; a polyalcohol; and an alkali compound. Preferably, the polishing composition further includes a non-ionic surfactant.
