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SOURCE D'ELECTRONS, SOURCE DE RAYONNEMENT X ET DISPOSITIF EMPLOYANT LA SOURCE DE RAYONNEMENT X
专利权人:
NUCTECH COMPANY LIMITED
发明人:
TANG, HUAPING,CHEN, ZHIQIANG,LI, YUANJING,WANG, YONGGANG,QIN, ZHANFENG
申请号:
CA2919744
公开号:
CA2919744C
申请日:
2015.08.19
申请国别(地区):
CA
年份:
2018
代理人:
摘要:
The present disclosure is directed to an electron source and an X-ray sourceusing thesame. The electron source of the present invention comprises: at least twoelectronemission zones, each of which comprises a plurality of micro electron emissionunits,wherein the micro electron emission unit comprises: a base layer, aninsulating layer onthe base layer, a grid layer on the insulating layer, an opening in the gridlayer, and anelectron emitter that is fixed at the base layer and corresponds to a positionof the opening,wherein the micro electron emission units in the same electron emission zoneareelectrically connected and simultaneously emit electrons or do not emitelectrons at thesame time, and wherein different electron emission zones are electricallypartitioned.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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